Inherent selective pulsed chemical vapor deposition of aluminum oxide in nm scale-Reference-Cited by-同舟云学术

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Inherent selective pulsed chemical vapor deposition of aluminum oxide in nm scale

Published:2023-06 Issue: Volume:622 Page:156824
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Cho Yunil,Huang James,Zhang Zichen,Wang Kesong,Lee Ping-che,Kim Chanyoung,Wong Keith,Nemani Srinivas,Yieh Ellie,Kummel Andrew C.

Funder

National Science Foundation

Applied Materials Inc

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference31 articles.

1. Inherently selective water-free deposition of titanium dioxide on the nanoscale: implications for nanoscale patterning;Cho;ACS Appl. Nano Mater.,2022

2. The use of atomic layer deposition in advanced nanopatterning;Mackus;Nanoscale,2014

3. Selective pulsed chemical vapor deposition of water-free TiO2/Al2O3 and HfO2/Al2O3 nanolaminates on Si and SiO2 in preference to SiCOH;Huang;ACS Appl. Mater. Interfaces,2022

4. Inherent selective pulsed chemical vapor deposition of amorphous hafnium oxide/titanium oxide nanolaminates;Cho;Appl. Surf. Sci.,2022

5. Fully self-aligned via integration for interconnect scaling beyond 3nm node;Chen;IEEE IEDM,2021

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