Inherent selective pulsed chemical vapor deposition of amorphous hafnium oxide / titanium oxide nanolaminates-Reference-Cited by-同舟云学术

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Inherent selective pulsed chemical vapor deposition of amorphous hafnium oxide / titanium oxide nanolaminates

Published:2022-10 Issue: Volume:600 Page:154010
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Cho Yunil,Huang James,Ahles Christopher F.,Zhang Zichen,Wong Keith,Nemani Srinivas,Yieh Ellie,Kummel Andrew C.

Funder

National Science Foundation

Applied Materials Inc

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference36 articles.

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2. Inherently Selective Water-Free Deposition of Titanium Dioxide on the Nanoscale: Implications for Nanoscale Patterning;Cho;ACS Appl. Nano Mater.,2022

3. Vapor Deposition of Ruthenium from an Amidinate Precursor;Li;Journal of The Electrochemical Society,2007

4. The use of atomic layer deposition in advanced nanopatterning;Mackus;Nanoscale,2014

5. Inherent substrate-dependent growth initiation and selective-area atomic layer deposition of TiO2 using “water-free” metal-halide/metal alkoxide reactants;Atanasov;Journal of Vacuum Science and Technology A,2016

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