Inherently Selective Water-Free Deposition of Titanium Dioxide on the Nanoscale: Implications for Nanoscale Patterning-Reference-Cited by-同舟云学术

Inherently Selective Water-Free Deposition of Titanium Dioxide on the Nanoscale: Implications for Nanoscale Patterning

Published:2022-01-19 Issue:1 Volume:5 Page:476-485
ISSN:2574-0970
Container-title:ACS Applied Nano Materials
language:en
Short-container-title:ACS Appl. Nano Mater.

Author:

Cho Yunil¹^ORCID,Ahles Christopher F.²,Choi Jong Youn²^ORCID,Huang James²,Jan Antony³,Wong Keith³,Nemani Srinivas³,Yieh Ellie³,Kummel Andrew C.⁴^ORCID

Affiliation:

1. Electrical and Computer Engineering Program, University of California, San Diego, La Jolla, California 92093, United States

2. Materials Science and Engineering Program, University of California, San Diego, La Jolla, California 92093, United States

3. Applied Materials, Sunnyvale, California 95054, United States

4. Department of Chemistry & Biochemistry, University of California, San Diego, La Jolla, California 92093, United States

Funder

Applied Materials

Division of Electrical, Communications and Cyber Systems

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsanm.1c03311

Reference31 articles.

1. Inherent substrate-dependent growth initiation and selective-area atomic layer deposition of TiO2 using “water-free” metal-halide/metal alkoxide reactants

2. Vapor Deposition of Ruthenium from an Amidinate Precursor

3. www.beneq.com/en/technology (last access Nov 29, 2021).

4. A Selective Toolbox for Nanofabrication

5. The use of atomic layer deposition in advanced nanopatterning

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