Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition-Reference-Cited by-同舟云学术

Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition

Published:2020-08-31 Issue:39 Volume:12 Page:44225-44237
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Rafie Borujeny Elham¹^ORCID,Sendetskyi Oles²³,Fleischauer Michael D.²³,Cadien Kenneth C.¹

Affiliation:

1. Department of Chemical and Materials Engineering, University of Alberta, 12th Floor − Donadeo Innovation Centre for Engineering (ICE), 9211-116 Street NW, Edmonton, Alberta, Canada T6G 1H9

2. National Research Council−Nanotechnology Research Centre, 11421 Saskatchewan Dr., Edmonton, Alberta, Canada T6G 2M9

3. Department of Physics, University of Alberta, Edmonton, Alberta, Canada T6G 2E1

Funder

National Research Council Canada

Government of Canada

University of Alberta

Natural Sciences and Engineering Research Council of Canada

Alberta Innovates

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.0c08477

Reference57 articles.

1. A review of Ga2O3materials, processing, and devices

2. Plasma enhanced atomic layer deposition of Ga2O3thin films

3. Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition

4. Low temperature Ga2O3 atomic layer deposition using gallium tri-isopropoxide and water

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