Understanding the Mechanism of Electronic Defect Suppression Enabled by Nonidealities in Atomic Layer Deposition-Reference-Cited by-同舟云学术

Understanding the Mechanism of Electronic Defect Suppression Enabled by Nonidealities in Atomic Layer Deposition

Published:2019-11-28 Issue:1 Volume:142 Page:134-145
ISSN:0002-7863
Container-title:Journal of the American Chemical Society
language:en
Short-container-title:J. Am. Chem. Soc.

Author:

Kavrik Mahmut Sami¹^ORCID,Bostwick Aaron²,Rotenberg Eli²,Tang Kechao³^ORCID,Thomson Emily¹,Aoki Toshihiro⁴,Fruhberger Bernd⁵,Taur Yuan¹,McIntyre Paul C.³,Kummel Andrew C.¹^ORCID

Affiliation:

1. Materials Science and Engineering, University of California San Diego, La Jolla, California 92093, United States

2. Advanced Light Source (ALS), E. O. Lawrence Berkeley Laboratory, Berkeley, California United States

3. Materials Science and Engineering, Stanford University, Stanford, California 94305, United States

4. Irvine Materials Research Institute, University of California Irvine, Irvine, California, United States

5. California Institute for Telecommunications and Information Technology, University of California San Diego, La Jolla, California 92093, United States

Funder

National Science Foundation

Lawrence Berkeley National Laboratory

Taiwan Semiconductor Manufacturing Company

Publisher

American Chemical Society (ACS)

Subject

Colloid and Surface Chemistry,Biochemistry,General Chemistry,Catalysis

Link

https://pubs.acs.org/doi/pdf/10.1021/jacs.9b06640

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