Remote Hydrogen Plasma Chemical Vapor Deposition from (Dimethylsilyl)(trimethylsilyl)methane. 2. Property−Structure Relationships for Resulting Silicon−Carbon Films
Author:
Affiliation:
1. Institute of Polymers, Faculty of Chemistry, Technical University of Łódź, PL-90924 Łódź, Poland
2. Groupe des Couches Minces and Department of Engineering Physics, Ecole Polytechnique, Montreal, Quebec H3C 3A7, Canada
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm0212515
Reference47 articles.
1. Optical properties of chemically ordereda‐Si1−xCx: H alloys
2. Electronic and optical properties of a-Si1-xCx films prepared from a H2-diluted mixture of SiH4 and CH4
3. Structural and optical properties of hydrogenated amorphous silicon carbide deposited by glow discharge from C3H8‐SiH4‐H2mixture
4. Transient photoconductivity in a-Si1−x C x :H thin films
5. Dependence of electrical and optical properties of amorphous SiC:H thin films grown by rf plasma enhanced chemical vapor deposition on annealing temperature
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