Amorphous silicon carbonitride a‐SiCN thin film coatings by remote plasma chemical vapor deposition using organosilicon precursor: Effect of plasma composition-Reference-Cited by-同舟云学术

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Amorphous silicon carbonitride a‐SiCN thin film coatings by remote plasma chemical vapor deposition using organosilicon precursor: Effect of plasma composition

Published:2022-11-29 Issue:3 Volume:20 Page:2200154
ISSN:1612-8850
Container-title:Plasma Processes and Polymers
language:en
Short-container-title:Plasma Processes & Polymers

Author:

Wrobel Aleksander M.¹^ORCID,Uznanski Pawel¹^ORCID

Affiliation:

1. Centre of Molecular and Macromolecular Studies Polish Academy of Sciences Lodz Poland

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/ppap.202200154

Reference61 articles.

1. High power deposition and analytics of amorphous silicon carbide films

2. Ion-assisted deposition of CN and SiCN films

3. Characterization of amorphous SiC:H films deposited from hexamethyldisilazane

4. Mechanical and fracture toughness studies of amorphous SiC–N hard coatings using nanoindentation

5. Hardness and stiffness of amorphous SiCxNy chemical vapor deposited coatings

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