Amorphous silicon carbonitride thin-film coatings produced by remote nitrogen microwave plasma chemical vapour deposition using organosilicon precursor-Reference-Cited by-同舟云学术

Amorphous silicon carbonitride thin-film coatings produced by remote nitrogen microwave plasma chemical vapour deposition using organosilicon precursor

Published:2017-05-25 Issue:12 Volume:31 Page:e3871
ISSN:0268-2605
Container-title:Applied Organometallic Chemistry
language:en
Short-container-title:Appl Organometal Chem

Author:

Wrobel A.M.¹^ORCID,Uznanski P.¹,Walkiewicz-Pietrzykowska A.¹,Jankowski K.¹

Affiliation:

1. Centre of Molecular and Macromolecular Studies; Polish Academy of Sciences; Sienkiewicza 112 90-363 Lodz Poland

Publisher

Wiley

Subject

Inorganic Chemistry,General Chemistry

Reference60 articles.

1. Synthesis of amorphous silicon carbonitride films by pulsed laser deposition

2. Hard silicon carbonitride films obtained by RF-plasma-enhanced chemical vapour deposition using the single-source precursor bis(trimethylsilyl)carbodiimide

3. Microstructure and mechanical properties of SiCN hard films deposited by an arc enhanced magnetic sputtering hybrid system

4. Hard and High-Temperature-Resistant Silicon Carbonitride Coatings Based on N-Silyl-Substituted Cyclodisilazane Rings

5. Effect of nitrogen content on phase configuration, nanostructure and mechanical behaviors in magnetron sputtered SiCxNy thin films

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