Remote hydrogen microwave plasma chemical vapor deposition from methylsilane precursors. 2. Surface morphology and properties of deposited a-SiC:H films-Reference-Cited by-同舟云学术

Remote hydrogen microwave plasma chemical vapor deposition from methylsilane precursors. 2. Surface morphology and properties of deposited a-SiC:H films

Published:2014-08 Issue: Volume:564 Page:232-240
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Wrobel A.M.,Walkiewicz-Pietrzykowska A.,Uznanski P.

Funder

National Center for Science

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference47 articles.

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3. Open-air laser-induced chemical vapor deposition of silicon carbide coatings;Jensen;Surf. Coat. Technol.,2006

4. Fourier transform infrared spectroscopy investigation of chemical bonding in low-k a-SiC:H thin films;King;J. Non-Cryst. Solids,2011

5. Mass and bond density measurements for PECVD a-SiCx:H thin films using Fourier transform-infrared spectroscopy;King;J. Non-Cryst. Solids,2011

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