Ultrathin SiO2 on Si. VII. Angular accuracy in XPS and an accurate attenuation length
Author:
Publisher
Wiley
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference15 articles.
1. Ultrathin SiO2 on Si II. Issues in quantification of the oxide thickness
2. Ultrathin SiO2 on Si. VI. Evaluation of uncertainties in thickness measurement using XPS
3. Critical review of the current status of thickness measurements for ultrathin SiO2 on Si Part V: Results of a CCQM pilot study
4. The Thickogram: a method for easy film thickness measurement in XPS
5. Calculations of electorn inelastic mean free paths. II. Data for 27 elements over the 50-2000 eV range
Cited by 48 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. A model for spectroscopic ellipsometry analysis of plasma-activated Si surfaces for direct wafer bonding;Applied Physics Letters;2022-08-22
2. Recent Advances to Establish XPS as an Accurate Metrology Tool;Journal of Surface Analysis;2022
3. Measurement of Silicon Oxide Film Thickness by X-ray Photoelectron Spectroscopy with ISO 14701;Journal of Surface Analysis;2022
4. Review on the thickness measurement of ultrathin oxide films by mutual calibration method;Surface and Interface Analysis;2021-12
5. The Surface Analysis Working Group at the Consultative Committee for Amount of Substance, Metrology in Chemistry and Biology : A successful initiative by Martin Seah;Surface and Interface Analysis;2021-11-07
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3