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Review on the thickness measurement of ultrathin oxide films by mutual calibration method

  • Published:2021-12 Issue: Volume: Page:
  • ISSN:0142-2421
  • Container-title:Surface and Interface Analysis
  • language:en
  • Short-container-title:Surf Interface Anal

Author:

Kim Kyung Joong1ORCID

Affiliation:

1. Surface Analysis Team Korea Research Institute of Standards and Science Daejeon South Korea

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference25 articles.

1. Development of new TiN/ZrO2/Al2O3/ZrO2/TiN capacitors extendable to 45 nm generation DRAMs replacing HfO2 based dielectrics;Kil DS;VLSI,2006

2. Ultrathin SiO2 on Si: III Mapping the layer thickness efficiently by XPS;Seah MP;Surf Interface Anal,2002

3. Critical review of the current status of thickness measurements for ultrathin SiO2 on Si Part V: Results of a CCQM pilot study;Seah MP;Surf Interface Anal,2004

4. Ultrathin SiO2 on Si IX: Absolute measurements of the amount of silicon oxide as a thickness of SiO2 on Si;Seah MP;Surf Interface Anal,2009

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