Recent Advances to Establish XPS as an Accurate Metrology Tool

Author:

Seah M. P.1

Affiliation:

1. National Physical Laboratory

Publisher

Surface Analysis Society of Japan

Subject

General Medicine

Reference20 articles.

1. [1] C. J. Powell and A Jablonski, J. Phys. Chem. Ref. Data 28, 19 (1999).

2. [2] M. P. Seah and I S Gilmore, Surf. Interface Anal. 31, 778 (2001).

3. [3] CCQM, Consultative Committee for Amount of Substance – Metrology in Chemistry. http//www.bipm,fr/enus/2. Committees/CCQM.shtml.

4. [4] D. A. Cole, J. R. Shallenberger, S. W. Novak, R. L. Moore, M. J. Edgell, S. P. Smith, C. J. Hotzman, J. F. Kirchhoff, E. Principe, W. Neiveen, F. K. Haang, S. Biswas, R. J. Bleiler and K. Jones, J. Vac. Sci. Technol. B 18, 440 (2000).

5. [5] International Technology Roadmap for Semiconductors (2001 and later editions). http//public.itrs.net/.

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