Measurement of Silicon Oxide Film Thickness by X-ray Photoelectron Spectroscopy with ISO 14701-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Measurement of Silicon Oxide Film Thickness by X-ray Photoelectron Spectroscopy with ISO 14701

Published:2022 Issue:3 Volume:28 Page:173-178
ISSN:1341-1756
Container-title:Journal of Surface Analysis
language:en
Short-container-title:JSA

Author:

Yamauchi Yasuo¹,Oizumi Shoya¹,Ohnishi Satoka¹

Affiliation:

1. Yazaki Corporation

Publisher

Surface Analysis Society of Japan

Subject

General Medicine

Link

https://www.jstage.jst.go.jp/article/jsa/28/3/28_173/_pdf

Reference15 articles.

1. [ 1] 藤本俊幸, 山岸秀一, 東康史, 高辻利之, 渡部司, 表面科学, 28, 494 (2007).

2. [ 2] 和田順雄, 応用物理, 65, 11 (1996).

3. [ 3] M. P. Seah, J. Surf. Anal., 12, 70 (2005).

4. [ 4] ISO 14701:2018, Surface chemical analysis — X-ray photoelectron spectroscopy — Measurement of silicon oxide thickness.

5. [ 5] M. P. Seah, S. J. Spencer, Journal of Vacuum Science & Technology A, 12, 345 (2003).

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP