Anamorphic objective design for extreme ultraviolet lithography at the 5∼1 nm technology node
Author:
Funder
National Natural Science Foundation of China
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering
Reference5 articles.
1. EUV lithography optics for sub-9nm resolution
2. Imaging performance of EUV lithography optics configuration for sub-9nm resolution
3. Imaging performance of the EUV high NA anamorphic system
4. EUV lithography scanner for sub-8nm resolution
5. Design of anamorphic magnification high-numerical aperture objective for extreme ultraviolet lithography by curvatures combination method
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Exploring ablation of GaAs at atomic and close-to-atomic scale by pulsed laser and 3D TTM–MD simulations;Optics & Laser Technology;2024-04
2. Simulation of display thermal deformation and error analysis in high precision reverse Hartmann test;Pacific-Rim Laser Damage 2023: Optical Materials for High-Power Lasers;2023-12-23
3. Optical system design of double-sided telecentric microscope with high numerical aperture and long working distance;Optics Express;2023-06-28
4. 极紫外光刻机曝光系统光学设计研究与进展;Acta Optica Sinica;2023
5. Circular Subaperture Stitching Interferometry Based on Polarization Grating and Virtual–Real Combination Interferometer;Sensors;2022-11-24
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3