Imaging performance of the EUV high NA anamorphic system-Reference-Cited by-同舟云学术

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Imaging performance of the EUV high NA anamorphic system

Published:2015-09-04 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

van Ingen Schenau Koen,Bottiglieri Gerardo,van Schoot Jan,Neumann Jens-Timo,Roesch Matthias

Publisher

SPIE

Reference7 articles.

1. EUV lithography: NXE platform performance overview;Peeters,2014

2. EUVL lithography scanner for sub 9nm resolution;Van Schoot,2014

3. EUV lithography optics for sub 9nm resolution;Migura,2014

4. EUV lithography optics for sub-9nm resolution;Kneer,2015

5. EUV lithography scanner for sub-8nm resolution;van Schoot,2015

Cited by 16 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Design of A Large Field of View High Numerical Aperture Extreme Ultraviolet Lithography Illumination System;2023 International Workshop on Advanced Patterning Solutions (IWAPS);2023-10-26

2. 极紫外光刻机曝光系统光学设计研究与进展;Acta Optica Sinica;2023

3. Anamorphic objective design for extreme ultraviolet lithography at the 5∼1 nm technology node;Applied Optics;2021-08-16

4. Design of a miniature anamorphic lens with a freeform front group and an aspheric rear group;Optical Engineering;2021-06-17

5. Design method for an off-axis reflective anamorphic optical system with aberration balance and constraint control;Applied Optics;2021-05-21

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