极紫外光刻机曝光系统光学设计研究与进展-Reference-Cited by-同舟云学术

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极紫外光刻机曝光系统光学设计研究与进展

Published:2023 Issue:15 Volume:43 Page:1522002
ISSN:0253-2239
Container-title:Acta Optica Sinica
language:en
Short-container-title:光学学报

Author:

Li Yanqiu 李艳秋,Nan Yanbei 南雁北,Chen Yuqing 陈雨情,Yan Xu 闫旭,Zhang Xinyi 张心怡,Liu Lihui 刘丽辉

Publisher

Shanghai Institute of Optics and Fine Mechanics

Subject

Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference154 articles.

1. Microlithography: science and technology;B W Smith,2007

2. EUV optics: status, outlook and future;P Graeupner;Proceedings of SPIE,2022

3. The International Roadmap for Devices and Systems 2022,0

4. Outlook for high-NA EUV patterning: a holistic patterning approach to address upcoming challenges;S Grzeskowiak;Proceedings of SPIE,2022

5. Anamorphic high-NA EUV lithography optics;B Kneer;Proceedings of SPIE,2015

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Pupil-Shaping Technique in Extreme Ultraviolet Lithography Illumination System;CHIN J LASERS;2024

2. Optimization Design Method of a 6‐DOF Micromanipulation Mechanism for Extreme Ultraviolet Projection Lithography Objective Lens;Shock and Vibration;2024-01

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