Aerial image based technique for measurement of lens aberrations up to 37th Zernike coefficient in lithographic tools under partial coherent illumination-Reference-Cited by-同舟云学术

Aerial image based technique for measurement of lens aberrations up to 37th Zernike coefficient in lithographic tools under partial coherent illumination

Published:2009-10-09 Issue:21 Volume:17 Page:19278
ISSN:1094-4087
Container-title:Optics Express
language:en
Short-container-title:Opt. Express

Author:

Liu Wei,Liu Shiyuan,Zhou Tingting,Wang Lijuan

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Reference20 articles.

1. Understanding lens aberration and influences to lithographic imaging

2. Aberration measurement of photolithographic lenses by use of hybrid diffractive photomasks

3. Measurement technique for in situ characterizing aberrations of projection optics in lithographic tools

4. Techniques for measuring aberrations in lenses used in photolithography with printed patterns

5. Beugungstheorie des schneidenver-fahrens und seiner verbesserten form, der phasenkontrastmethode

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