Measurement technique for in situ characterizing aberrations of projection optics in lithographic tools-Reference-Cited by-同舟云学术

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Measurement technique for in situ characterizing aberrations of projection optics in lithographic tools

Published:2006-08-20 Issue:24 Volume:45 Page:6086
ISSN:0003-6935
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Wang Fan,Wang Xiangzhao,Ma Mingying

Publisher

The Optical Society

Reference14 articles.

1. Impact of lens aberrations on optical lithography

2. Impact of wavefront errors on low k1 processes at extremely high NA

3. New paradigm in lens metrology for lithographic scanner: evaluation and exploration

4. New-generation projection optics for ArF lithography

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. In situaberration measurement method using a phase-shift ring mask;Journal of Micro/Nanolithography, MEMS, and MOEMS;2014-11-13

2. Extreme ultraviolet lithography resist-based aberration metrology;Journal of Micro/Nanolithography, MEMS, and MOEMS;2013-10-02

3. In situaberration measurement technique based on an aerial image with an optimized source;Optical Engineering;2013-06-11

4. In situ aberration measurement technique based on aerial image with optimized source;SPIE Proceedings;2012-12-18

5. In-situ measurement of lens aberrations in lithographic tools using CTC-based quadratic aberration model;SPIE Proceedings;2012-02-21

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