In situ aberration measurement technique based on aerial image with optimized source-Reference-Cited by-同舟云学术

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In situ aberration measurement technique based on aerial image with optimized source

Published:2012-12-18 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Yan Guanyong¹,Wang Xiangzhao¹,Li Sikun¹,Yang Jishuo¹,Xu Dongbo¹,Duan Lifeng²,Bourov Anatoly Y.²,Erdmann Andreas³

Affiliation:

1. Shanghai Institute of Optics and Fine Mechanics (China)

2. Shanghai Micro Electronics Equipment Co., Ltd. (China)

3. Fraunhofer-Institut für Integrierte System und Bauelementetechnologie (Germany)

Publisher

SPIE

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. High-order wavefront aberration measurement method for hyper-NA lithographic projection lens based on a binary target and rotated regression matrix;Optics Communications;2019-01

2. Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image;Applied Optics;2016-04-13

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