Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image-Reference-Cited by-同舟云学术

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Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image

Published:2016-04-13 Issue:12 Volume:55 Page:3192
ISSN:1559-128X
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Zhu Boer,Wang Xiangzhao,Li Sikun,Yan Guanyong,Shen Lina,Duan Lifeng

Funder

National Natural Science Foundation of China (NSFC)

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering

Reference26 articles.

1. Aberration averaging using point spread function for scanning projection systems

2. Impact of lens aberrations on optical lithography

3. The impact of aberration averaging during step-and-scan on the photolithographic process

4. Impact of wavefront errors on low k1 processes at extremely high NA

5. Aerial image measurement methods for fast aberration set-up and illumination pupil verification

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. 基于空间像主成分分析的光刻投影物镜波像差检测技术;Acta Optica Sinica;2023

2. Hardware/Software Support for Correlation Detection in Holographic Wavefront Sensors;Optics and Spectroscopy;2019-10

3. High-order wavefront aberration measurement method for hyper-NA lithographic projection lens based on a binary target and rotated regression matrix;Optics Communications;2019-01

4. A nonlinear measurement method of polarization aberration in immersion projection optics by spectrum analysis of aerial image;Optics Express;2018-11-28

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