Author:
Lei Wei 雷威,Li Sikun 李思坤,Pan Dongchao 潘东超,Jiang Yipeng 江一鹏,Tong Tong 佟桐,Wang Xiangzhao 王向朝,Bu Yang 步扬
Publisher
Shanghai Institute of Optics and Fine Mechanics
Subject
Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference37 articles.
1. 先进光刻技术的发展历程与最新进展;李艳丽;激光与光电子学进展,2022
2. Evolution and updates of advanced photolithography technology;Y L Li;Laser & Optoelectronics Progress,2022
3. Simplified analytical method for error sources in Mueller matrix imaging polarimeter;S K Li;Acta Optica Sinica,2019
4. 穆勒矩阵成像椭偏仪误差源的简化分析方法;孟泽江;光学学报,2019
5. Fast thermal aberration model for lithographic projection lenses;S K Li;Optics Express,2019
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