Fast thermal aberration model for lithographic projection lenses
Author:
Funder
Natural Science Foundation of Shanghai
National Science and Technology Major Project of China
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics
Reference14 articles.
1. Thermal aberration control for low-k1 lithography
2. Research development of thermal aberration in 193nm lithography exposure system
3. Improving image control by correcting the lens-heating focus drift
4. Fine-tune lens-heating-induced focus drift with different process and illumination settings
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