In situaberration measurement method using a phase-shift ring mask-Reference-Cited by-同舟云学术

In situaberration measurement method using a phase-shift ring mask

Published:2014-11-13 Issue:1 Volume:14 Page:011005
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Li Sikun¹,Wang Xiangzhao²,Yang Jishuo²,Duan Lifeng³,Tang Feng²,Yan Guanyong²

Affiliation:

1. Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, Laboratory of Information Optics and Opto-Electronic Technology, Shanghai 201800, China

2. Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, Laboratory of Information Optics and Opto-Electronic Technology, Shanghai 201800, ChinabUniversity of the Chinese Academy of Sciences, Beijing 100039, China

3. Shanghai Micro Electronics Equipment Co., Ltd., System Engineering Department, Shanghai 201203, China

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference28 articles.

1. Understanding lens aberration and influences to lithographic imaging

2. Impact of wavefront errors on low k1 processes at extremely high NA

3. Optical lithography into the millennium: sensitivity to aberrations, vibration, and polarization

4. Aerial image measurement methods for fast aberration set-up and illumination pupil verification

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1. Calibration of polarization effect of a high-numerical-aperture objective lens with Mueller matrix polarimetry;Measurement Science and Technology;2018-12-21

2. Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image;Applied Optics;2016-04-13