Plasma resistant glass (PRG) for reducing particulate contamination during plasma etching in semiconductor manufacturing: A review
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Mechanics of Materials,General Materials Science
Reference110 articles.
1. Investigation of the relationship between plasma etching characteristics and microstructures of alumina ceramics for chamber parts;Kasashima;Jpn. J. Appl. Phys.,2019
2. New chamber walls conditioning and cleaning strategies to improve the stability of plasma processes;Cunge;Plasma Sources Sci. Technol.,2005
3. H. Shih, A Systematic Study and Characterization of Advanced Corrosion Resistance Materials and Their Applications for Plasma Etching Processes in Semiconductor Silicon Wafer Fabrication, 2011. https://doi.org/10.5772/31992.
4. Review of inductively coupled plasmas: nano-applications and bistable hysteresis physics;Lee;Appl. Phys. Rev.,2018
5. Recent advances in reactive ion etching and applications of high-aspect-ratio microfabrication;Huff;Micromachines,2021
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Plasma etching resistance and mechanical properties of polymorph Gd2O3-MgO nanocomposite with Zr phase stabilizer incorporation;Applied Surface Science;2024-11
2. Nonthermal plasma technologies for advanced functional material processing and current applications: Opportunities and challenges;Journal of Environmental Chemical Engineering;2024-10
3. Effect of YF3 on fluorocarbon plasma resistance of Y2O3–Al2O3–B2O3 glasses;Ceramics International;2024-09
4. Analysis of plasma etching reactivity of bismuth aluminosilicate glasses using fluorine concentration;Journal of Non-Crystalline Solids;2024-04
5. Microstructural characterization and inductively coupled plasma-reactive ion etching resistance of Y2O3–Y4Al2O9 composite under CF4/Ar/O2 mixed gas conditions;Scientific Reports;2024-03-25
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3