Electron dynamics in high power impulse magnetron sputtering discharges
Author:
Publisher
Elsevier
Reference62 articles.
1. A strategy for increased carbon ionization in magnetron sputtering discharges;Aijaz;Diamond and Related Materials,2012
2. Plasma dynamics in a highly ionized pulsed magnetron discharge;Alami;Plasma Sources Science and Technology,2005
3. Spatial electron density distribution in a high-power pulsed magnetron discharge;Bohlmark;IEEE Transactions on Plasma Science,2005
4. The effect of changing the magnetic field strength on HiPIMS deposition rates;Bradley;Journal of Physics D: Applied Physics,2015
5. Time-resolved plasma parameters in the HiPIMS discharge with Ti target in Ar/O2 atmosphere;Čada;Surface and Coatings Technology,2011
Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Obtaining plasma parameters by Langmuir probes and optical emission spectroscopy in low-pressure DC plasma;Radiation Effects and Defects in Solids;2023-04-06
2. Influence of the magnetic field on the discharge physics of a high power impulse magnetron sputtering discharge;Journal of Physics D: Applied Physics;2021-10-06
3. Low temperature growth of stress-free single phase α-W films using HiPIMS with synchronized pulsed substrate bias;Journal of Applied Physics;2021-04-21
4. Experimental verification of deposition rate increase, with maintained high ionized flux fraction, by shortening the HiPIMS pulse;Plasma Sources Science and Technology;2021-04-01
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3