Influence of the magnetic field on the discharge physics of a high power impulse magnetron sputtering discharge-Reference-Cited by-同舟云学术

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Influence of the magnetic field on the discharge physics of a high power impulse magnetron sputtering discharge

Published:2021-10-06 Issue:1 Volume:55 Page:015202
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Rudolph M^ORCID,Brenning N^ORCID,Hajihoseini H^ORCID,Raadu M A,Minea T M^ORCID,Anders A^ORCID,Gudmundsson J T^ORCID,Lundin D^ORCID

Funder

Swedish Government Strategic Research Area in Materials Science on Functional Materials at Linkoping University

Vetenskapsrådet

Icelandic Research Fund

Free State of Saxony and the European Regional Development Fund

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1088/1361-6463/ac2968/pdf

Reference35 articles.

1. Physics and technology of magnetron sputtering discharges

2. Magnetron sputtering: a review of recent developments and applications

3. Planar magnetron sputtering

4. Reconstruction of the static magnetic field of a magnetron

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1. High power impulse magnetron sputtering of a zirconium target;Journal of Vacuum Science & Technology A;2024-06-25

2. Inception of positive wire-cylinder corona discharges in air in crossed electric and magnetic fields;Journal of Physics D: Applied Physics;2024-06-13

3. On working gas rarefaction in high power impulse magnetron sputtering;Plasma Sources Science and Technology;2024-06-04

4. Effect of peak discharge current on the ion current density on the substrate in the short-pulse HiPIMS;Vacuum;2024-06

5. 2D analysis of sputtered species transport in high-power impulse magnetron sputtering (HiPIMS) discharge;Journal of Applied Physics;2024-05-02

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