Time-resolved plasma parameters in the HiPIMS discharge with Ti target in Ar/O2 atmosphere-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Time-resolved plasma parameters in the HiPIMS discharge with Ti target in Ar/O2 atmosphere

Published:2011-07 Issue: Volume:205 Page:S317-S321
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Čada Martin,Hubička Zdeněk,Adámek Petr,Klusoň Jan,Jastrabík Lubomír

Funder

Academy of Sciences of the Czech Republic

Ministry of Education, Youth, and Sports of the Czech Republic

Czech Science Foundation

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference18 articles.

1. Ionized physical vapor deposition (IPVD): A review of technology and applications

2. Deposition of zinc oxide layers by high-power impulse magnetron sputtering

3. High power pulsed magnetron sputtering: Fundamentals and applications

4. A novel pulsed magnetron sputter technique utilizing very high target power densities

5. Measurements of Deposition Rate and Substrate Heating in a HiPIMS Discharge

Cited by 44 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Deposition of Fe2O3:Sn semiconducting thin films by reactive pulsed HiPIMS + ECWR co-sputtering from Fe and Sn targets;Journal of Photochemistry and Photobiology A: Chemistry;2024-09

2. Open‐Top Transparent TiO₂ Nanotubes Photoanodes from Evaporated Ti Layers on Fluorine‐Doped Tin Oxide;physica status solidi (a);2024-07-10

3. Study on Ion Flux From Magnetically Confined Low-Pressure Arc Discharge With a Thermionic Cathode to Substrate for High-Throughput Film Deposition Processes;IEEE Transactions on Plasma Science;2024

4. Fabrication of high aspect-ratio metallic nanotube array with highly-ordered periodicity using HiPIMS;Journal of Alloys and Compounds;2023-10

5. Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge;Journal of Vacuum Science & Technology A;2023-09-26

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3