Study on Ion Flux From Magnetically Confined Low-Pressure Arc Discharge With a Thermionic Cathode to Substrate for High-Throughput Film Deposition Processes-Reference-Cited by-同舟云学术

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Study on Ion Flux From Magnetically Confined Low-Pressure Arc Discharge With a Thermionic Cathode to Substrate for High-Throughput Film Deposition Processes

Published:2024 Issue: Volume: Page:1-10
ISSN:0093-3813
Container-title:IEEE Transactions on Plasma Science
language:
Short-container-title:IEEE Trans. Plasma Sci.

Author:

Asamoto Yuya¹^ORCID,Urabe Keiichiro¹^ORCID,Matsuda Takayuki¹,Hamano Takashi¹,Noma Masao²,Yamashita Michiru³,Hasegawa Shigehiko⁴,Eriguchi Koji¹

Affiliation:

1. Department of Aeronautics and Astronautics, Kyoto University, Kyoto, Japan

2. Shinko Seiki Company Ltd, Moriyama, Shiga, Japan

3. Hyogo Prefectural Institute of Technology, Kobe, Hyogo, Japan

4. Institute of Scientific and Industrial Research (SANKEN), Osaka University, Osaka, Japan

Funder

Grant-in-Aid for Scientific Research

Grant-in-Aid for JSPS Fellows from Japan Society for the Promotion of Science

Iketani Science and Technology Foundation

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Link

http://xplorestaging.ieee.org/ielx8/27/4360151/10588975.pdf?arnumber=10588975

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