A strategy for increased carbon ionization in magnetron sputtering discharges-Reference-Cited by-同舟云学术

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A strategy for increased carbon ionization in magnetron sputtering discharges

Published:2012-03 Issue: Volume:23 Page:1-4
ISSN:0925-9635
Container-title:Diamond and Related Materials
language:en
Short-container-title:Diamond and Related Materials

Author:

Aijaz Asim,Sarakinos Kostas,Lundin Daniel,Brenning Nils,Helmersson Ulf

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials

Reference23 articles.

1. Guiding the deposition flux in an ionized magnetron discharge

2. Ionized physical vapor deposition of integrated circuit interconnects

3. Microstructural evolution during film growth

4. Ionized physical vapor deposition (IPVD): A review of technology and applications

5. Ionized Physical Vapor Deposition,2000

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1. Effect of pulse interval on deposition of diamond-like carbon through high-power impulse magnetron sputtering;Diamond and Related Materials;2024-10

2. Quantification of the sp3 content in Diamond-Like carbon Films: Effects of Ne plasma addition in Deep Oscillation Magnetron sputtering;Applied Surface Science;2024-10

3. Sputtering yields of TiC and MAX phase Ti2AlC using Ne, Ar, Xe ions;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2024-09

4. Influence of Carbon ionization increment by adding Ne on the Bonding, Electrical, and Tribological properties of Carbon Thin Films deposited by HiPIMS;2024-06-19

5. Deuterium retention in tungsten co-deposits with neon and argon inclusions;Nuclear Materials and Energy;2024-06

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