Fabrication of buried layers of SiO2 and Si3N4 a using ion beam synthesis
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference43 articles.
1. Oxygen distributions in synthesized SiO2 layers formed by high dose O+ implantation into silicon
2. Silicon-on-insulator by oxygen ion implantation
3. MRS European Meeting;Hemment,1985
4. High quality Si‐on‐SiO2films by large dose oxygen implantation and lamp annealing
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