High quality Si‐on‐SiO2films by large dose oxygen implantation and lamp annealing
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.96497
Reference14 articles.
1. Silicon on Insulator by High Dose Implantation
2. Formation of Buried Oxide in Silicon by High-Dose Oxygen Implantation, and Application of this Technology to CMOS Devices
3. Silicon-on-insulator by oxygen ion implantation
4. Effects of implantation temperature on the properties of buried oxide layers in silicon formed by oxygen ion implantation
5. Microstructure of silicon implanted with high dose oxygen ions
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