Oxygen distributions in synthesized SiO2 layers formed by high dose O+ implantation into silicon
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference15 articles.
1. A study of silicon oxides prepared by oxygen implantation into silicon
2. Rutherford backscattering analysis of oxide layers formed by ion implantation into single-crystal silicon
3. Inst. of Phys. Conf. Ser. No. 57;Hayashi,1981
4. Metastable Materials Formation by Ion Implantation;Pinizzotto,1982
Cited by 60 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Formation of Conducting and Insulating Layered Structures in Si by Ion Implantation: Process Control Using FTIR Spectroscopy;Journal of The Electrochemical Society;2001
2. Polyenergy ion beam synthesis of buried oxynitride layer in silicon;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2000-11
3. How the type of bombarding ion affects the formation of radiation defects in silicon;Semiconductors;1998-05
4. Sputtering Yield Changes, Surface Movement and Apparent Profile Shifts in SIMS Depth Analyses of Silicon Using Oxygen Primary Ions;Surface and Interface Analysis;1996-06
5. Thermodynamic behaviour of GeO2 formed by oxygen implantation into relaxed Si0.5Ge0.5 alloy;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1995-03
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3