As–P interface-sensitive GaInP/GaAs structures grown in a production MBE system
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference10 articles.
1. X-ray photoemission characterization of interface abruptness and band offset of Ga0.5In0.5P grown on GaAs
2. High quality quantum wells of InGaP/GaAs grown by molecular beam epitaxy
3. Gas source molecular beam epitaxy growth of GaAs/InGaP superlattice as optical confinement layers in 0.98 μm InGaAs/InGaP strained quantum well lasers
4. Measurements of abrupt transitions in III–V compounds and heterostructures
5. Interface quality and electron transfer at the GaInP on GaAs heterojunction
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1. Tapered Cross Section Photoelectron Spectroscopy Provides Insights into the Buried Interfaces of III‐V Semiconductor Devices;Advanced Materials Interfaces;2022-12-04
2. The optimization of InGaAs/InGaP quantum wells grown by gas source molecular beam epitaxy;Journal of Crystal Growth;2021-10
3. Quantitative atomic resolution at interfaces: Subtraction of the background in STEM images with the example of (Ga,In)P/GaAs structures;Journal of Applied Physics;2017-01-14
4. Differences between GaAs/GaInP and GaAs/AlInP interfaces grown by movpe revealed by depth profiling and angle-resolved X-ray photoelectron spectroscopies;Applied Surface Science;2016-01
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