Atomic hydrogen-induced degradation of thin SiO2 gate oxides-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Atomic hydrogen-induced degradation of thin SiO2 gate oxides

Published:1995-07 Issue: Volume:187 Page:244-247
ISSN:0022-3093
Container-title:Journal of Non-Crystalline Solids
language:en
Short-container-title:Journal of Non-Crystalline Solids

Author:

Cartier E.,Buchanan D.A.,Stathis J.H.,DiMaria D.J.

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference16 articles.

1. Current-induced hydrogen migration and interface trap generation in aluminum-silicon dioxide-silicon capacitors

2. The Physics and Chemistry of SiO2 and the SiSiO2 Interface;Buchanan,1993

3. Theory of high-field electron transport in silicon dioxide

4. Trap creation in silicon dioxide produced by hot electrons

5. Interface and bulk trap generation in metal‐oxide‐semiconductor capacitors

Cited by 38 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Threshold voltage instability in III-nitride heterostructure metal–insulator–semiconductor high-electron-mobility transistors: Characterization and interface engineering;Applied Physics Reviews;2024-05-31

2. Annealing‐Free Ohmic Contacts to n‐Type GaN via Hydrogen Plasma‐Assisted Atomic Layer Deposition of Sub‐Nanometer AlO_x;Advanced Materials Interfaces;2023-12

3. Suppression and characterization of interface states at low-pressure-chemical-vapor-deposited SiN /III-nitride heterostructures;Applied Surface Science;2021-03

4. Molecular dynamics simulation of atomic hydrogen diffusion in strained amorphous silica*;Chinese Physics B;2020-02-01

5. Effect of alloying temperature on the capacitance-voltage and current-voltage characteristics of low-pressure chemical vapor deposition SiNx/n-GaN MIS structures;physica status solidi (a);2015-09-09

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3