Author:
Konh Mahsa,Wang Yang,Chen Hang,Bhatt Subhash,Xiao John Q.,Teplyakov Andrew V.
Funder
University of Delaware
National Science Foundation
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry
Reference44 articles.
1. IBM unveils world’s first 2 nanometer chip technology, opening a new frontier for semiconductors;McCarthy;IBM News Room.,2021
2. Prospects for Thermal atomic layer etching using sequential, self-limiting fluorination and ligand-exchange reactions;George;ACS Nano.,2016
3. Thermal atomic layer etching: a review;Fischer;J. Vac. Sci. Technol. A.,2021
4. Overview of atomic layer etching in the semiconductor industry;Kanarik;J. Vac. Sci. Technol. A.,2015
5. Mechanisms of thermal atomic layer etching;George;Acc. Chem. Res.,2020
Cited by
7 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献