Thermal Atomic Layer Etching Process for 2D van der Waals Material CrPS<sub>4</sub>-Reference-Cited by-同舟云学术

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Thermal Atomic Layer Etching Process for 2D van der Waals Material CrPS₄

Published:2024-08-08 Issue: Volume: Page:
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Piña Marissa D.¹,Whalen Matthew P.²,Xiao John Q.³^ORCID,Teplyakov Andrew V.¹^ORCID

Affiliation:

1. Department of Chemistry and Biochemistry, University of Delaware, Newark, Delaware 19716, United States

2. Quantum Science and Engineering Program, University of Delaware, Newark, Delaware 19716, United States

3. Department of Physics and Astronomy, University of Delaware, Newark, Delaware 19716, United States

Funder

Division of Civil, Mechanical and Manufacturing Innovation

Division of Materials Research

Publisher

American Chemical Society (ACS)

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.4c01606

Reference56 articles.

1. 2D materials: Rising star for future applications

2. Emerging 2D-ferromagnetism and strong spin-orbit coupling at the surface of valence-fluctuating EuIr2Si2

3. Two-dimensional bipolar ferromagnetic semiconductors from layered antiferromagnets

4. Emerging beyond-graphene elemental 2D materials for energy and catalysis applications

5. Air-Stable and Layer-Dependent Ferromagnetism in Atomically Thin van der Waals CrPS4

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