Surface Smoothing by Atomic Layer Deposition and Etching for the Fabrication of Nanodevices-Reference-Cited by-同舟云学术

Surface Smoothing by Atomic Layer Deposition and Etching for the Fabrication of Nanodevices

Published:2022-11-28 Issue:12 Volume:5 Page:18116-18126
ISSN:2574-0970
Container-title:ACS Applied Nano Materials
language:en
Short-container-title:ACS Appl. Nano Mater.

Author:

Gerritsen Sven H.¹,Chittock Nicholas J.¹,Vandalon Vincent¹,Verheijen Marcel A.¹²^ORCID,Knoops Harm C. M.¹³^ORCID,Kessels Wilhelmus M. M.¹^ORCID,Mackus Adriaan J. M.¹^ORCID

Affiliation:

1. Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600MBEindhoven, The Netherlands

2. Eurofins Materials Science, High Tech Campus 11, 5656AEEindhoven, The Netherlands

3. Oxford Instruments Plasma Technology, North End, BristolBS49 4AP, U.K.

Funder

Nederlandse Organisatie voor Wetenschappelijk Onderzoek

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsanm.2c04025

Reference54 articles.

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2. Lau, W. S.; Yu, D. Q.; Wang, X.; Wong, H.; Xu, Y. Confirmation of the Surface Smoothing Effect of Atomic Layer Deposition and the Physical Mechanism Responsible for Such an Effect. In China Semiconductor Technology International Conference 2016, CSTIC 2016, 2016; pp 3–5.

3. Surface-roughness effect on capacitance and leakage current of an insulating film

4. Ge FinFET CMOS Inverters With Improved Channel Surface Roughness by Using In-Situ ALD Digital O3 Treatment

5. Surface roughness scattering model for arbitrarily oriented silicon nanowires

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