Investigation of interface characteristics of Al2O3/Si under various O2 plasma exposure times during the deposition of Al2O3 by PA-ALD-Reference-Cited by-同舟云学术

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Investigation of interface characteristics of Al2O3/Si under various O2 plasma exposure times during the deposition of Al2O3 by PA-ALD

Published:2019-02 Issue:2 Volume:19 Page:155-161
ISSN:1567-1739
Container-title:Current Applied Physics
language:en
Short-container-title:Current Applied Physics

Author:

Min Kwan Hong,Choi Sungjin,Jeong Myeong Sang,Kang Min Gu,Park Sungeun,Song Hee-eun,Lee Jeong In,Kim Donghwan^ORCID

Funder

Research and Development of the Korea Institute of Energy Research

KETEP

Ministry of Knowledge Economy

NRF

Ministry of Science, ICT and Future Planning

Publisher

Elsevier BV

Subject

General Physics and Astronomy,General Materials Science

Reference38 articles.

1. Atomic layer deposition: an overview;George;Chem. Rev.,2010

2. Schottky barrier reduction for holes by Fermi level depinning using metal/nickel/oxide/silicon contacts;Lslam;Appl. Phys. Lett.,2017

3. Effective passivation of crystalline silicon surfaces by ultrathin atomic-layer-deposited TiOx layers;Titova;Energy Proc.,2017

4. Atomic layer deposition TiO2 films and TiO2/SiNx stacks applied for solar cells;Yang;Appl. Sci.,2016

5. Silicon heterojunction solar cells with electron selective TiOx contact;Yang;Sol. Energy Mater. Sol. Cells,2016

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1. Enhanced passivation and stability of negative charge injected SiNx with higher nitrogen content on the boron diffused surface of n-type Si solar cells;Solar Energy Materials and Solar Cells;2024-08

2. Insight into the suppression mechanism of bulk traps in Al2O3 gate dielectric and its effect on threshold voltage instability in Al2O3/AlGaN/GaN metal-oxide-semiconductor high electron mobility transistors;Applied Surface Science;2023-11

3. Improvement of RTS Noise and Peel Off Issue of BSI CIS Products by Changing FEP Film Stack Raw Material;2023 7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM);2023-03-07

4. Improvement of RTS Noise and Peel Off Issue of BSI CIS Products by Changing FEP Film Stack Raw Material;2023

5. Spatially‐Modulated Silicon Interface Energetics Via Hydrogen Plasma‐Assisted Atomic Layer Deposition of Ultrathin Alumina;Advanced Materials Interfaces;2022-12-16

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