Atomic Layer Deposition TiO2 Films and TiO2/SiNx Stacks Applied for Silicon Solar Cells-Reference-Cited by-同舟云学术

Atomic Layer Deposition TiO2 Films and TiO2/SiNx Stacks Applied for Silicon Solar Cells

Published:2016-08-19 Issue:8 Volume:6 Page:233
ISSN:2076-3417
Container-title:Applied Sciences
language:en
Short-container-title:Applied Sciences

Author:

Yang Zu-Po,Cheng Hsyi-En,Chang I-Hsuan,Yu Ing-Song

Publisher

MDPI AG

Subject

Fluid Flow and Transfer Processes,Computer Science Applications,Process Chemistry and Technology,General Engineering,Instrumentation,General Materials Science

Link

http://www.mdpi.com/2076-3417/6/8/233/pdf

Reference40 articles.

1. The path to 25% silicon solar cell efficiency: History of silicon cell evolution

2. Surface passivation of crystalline silicon solar cells: a review

3. Very low surface recombination velocities on p- and n-type c-Si by ultrafast spatial atomic layer deposition of aluminum oxide

4. Excellent Silicon Surface Passivation Achieved by Industrial Inductively Coupled Plasma Deposited Hydrogenated Intrinsic Amorphous Silicon Suboxide

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