Resputtering effects during ion beam assisted deposition and the sputter yield amplification effect
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference14 articles.
1. Patterning with the use of ion-assisted selective deposition
2. T-DYN Monte Carlo simulations applied to ion assisted thin film processes
3. Ion-assisted selective deposition of aluminium for via-hole interconnections
4. Numerical and experimental studies of the sputter yield amplification effect
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1. Ion kinetic energy- and ion flux-dependent mechanical properties and thermal stability of (Ti,Al)N thin films;Acta Materialia;2023-05
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3. Assessing the Electronic Structure of TaVOx and Its Electrochromic Performance in Combination with LiPSON;ACS Applied Energy Materials;2023-03-09
4. Sputtering of silicon by atomic and cluster bismuth ions: An influence of projectile nuclearity and specific kinetic energy on the sputter yield;Vacuum;2021-06
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