Patterning with the use of ion-assisted selective deposition
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference14 articles.
1. Glow Discharge Processes;Chapman,1980
2. Self‐limiting etch depths using simultaneous sputter etching/deposition technique
3. Influence of substrate material on the initial thin film growth during ion deposition from a glow discharge
4. Ion assisted selective thin film deposition
5. Proc IPAT Workshop-Semiconductor Technology;Berg,1986
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1. Compositional variations of sputter deposited Ti/W barrier layers on substrates with pronounced surface topography;Thin Solid Films;1999-07
2. Resputtering effects during ion beam assisted deposition and the sputter yield amplification effect;Surface and Coatings Technology;1996-10
3. Numerical and experimental studies of the sputter yield amplification effect;Radiation Effects and Defects in Solids;1994-07
4. Large-area selective thin film deposition by bias sputtering;Thin Solid Films;1994-04
5. Serial cosputtering of metals: modelling of sputtering from a periodically codeposited surface;Surface and Coatings Technology;1993-12
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