Large-area selective thin film deposition by bias sputtering-Reference-Cited by-同舟云学术

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Large-area selective thin film deposition by bias sputtering

Published:1994-04 Issue:1-2 Volume:241 Page:1-8
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Berg S.,Katardjiev I.V.,Nender C.,Carlsson P.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference15 articles.

1. Tridyn — A TRIM simulation code including dynamic composition changes

2. A Monte Carlo computer program for the transport of energetic ions in amorphous targets

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Enhanced adhesion through local epitaxy of transition-metal nitride coatings on ferritic steel promoted by metal ion etching in a combined cathodic arc/unbalanced magnetron deposition system;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2000-07

2. Preferential sputtering effects in thin film processing;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1999-07

3. Compositional variations of sputter deposited Ti/W barrier layers on substrates with pronounced surface topography;Thin Solid Films;1999-07

4. Reemission of sputtered refractory metals during deposition;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1998-05

5. High-vacuum-based processes;Handbook of Vacuum Science and Technology;1998

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