Ion-assisted selective deposition of aluminium for via-hole interconnections
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference21 articles.
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1. Review Article: Tracing the recorded history of thin-film sputter deposition: From the 1800s to 2017;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2017-09
2. A novel method to determine the ion sputter coefficient of dilute segregating impurities;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2001-09
3. Preferential sputtering effects in thin film processing;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1999-07
4. Compositional variations of sputter deposited Ti/W barrier layers on substrates with pronounced surface topography;Thin Solid Films;1999-07
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