Metal-Insulator-Metal capacitors with ALD grown SrTiO3: Influence of Pt electrodes
Author:
Publisher
IOP Publishing
Subject
General Medicine
Link
http://stacks.iop.org/1757-899X/41/i=1/a=012015/pdf
Reference16 articles.
1. A high-density MIM capacitor (13 fF/μm/sup 2/) using ALD HfO2 dielectrics
2. Metallorganic Chemical Vapor Deposition of Sr-Ta-O and Bi-Ta-O Films for Backend Integration of High-k Capacitors
3. Very high-density (23 fF//spl mu/m/sup 2/) RF MIM capacitors using high-/spl kappa/ TaTiO as the dielectric
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices;Journal of Applied Physics;2014-08-14
2. Surface smoothing effect of an amorphous thin film deposited by atomic layer deposition on a surface with nano-sized roughness;AIP Advances;2014-02
3. Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2014-01
4. Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD Sr x Ti y O z films;physica status solidi (a);2013-09-09
5. ALD of SrTiO3 and Pt for Pt/SrTiO3/Pt MIM Structures: Growth and Crystallization Study;ECS Transactions;2013-08-31
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