Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
Author:
Affiliation:
1. Peter-Grünberg Institute (PGI-7), Forschungszentrum Jülich and JARA-FIT, 52425 Jülich, Germany
2. Department of Applied Physics, Eindhoven University of Technology, 5600 MB Eindhoven, The Netherlands
Funder
Deutsche Forschungsgemeinschaft (DFG)
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4891831
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