Metallorganic Chemical Vapor Deposition of Sr-Ta-O and Bi-Ta-O Films for Backend Integration of High-k Capacitors

Author:

Goux L.,Vander Meeren H.,Wouters D. J.

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference18 articles.

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2. B. C. Hendrix and G. T. Stauf , inProceedings of the 2000 International Conference on High-Density Interconnect and Systems Packaging, p. 342, International Microelectronics and Packaging Society (2000).

3. Improvement in electrical insulating properties of 10-nm-thick Al2O3 film grown on Al/TiN/Si substrate by remote plasma annealing at low temperatures

4. High-density MIM capacitors using Al2O3 and AlTiOx dielectrics

5. T. Ishikawa, D. Kodama, Y. Matsui, M. Hiratani, T. Furusawa, and D. Hisamoto , Abstract 9.07, IEDM Symposium, IEEE (2002).

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