InAlN/GaN HEMTs based L-band high-power packaged amplifiers

Author:

Jardel Olivier,Jacquet Jean-Claude,Baczkowski Lény,Carisetti Dominique,Lancereau Didier,Olivier Maxime,Aubry Raphaël,di Forte Poisson Marie-Antoinette,Dua Christian,Piotrowicz Stéphane,Delage Sylvain L.

Abstract

This paper presents power results of L-band packaged hybrid amplifiers using InAlN/GaN/SiC HEMT power dies. The high-power densities achieved both in pulsed and continuous wave (cw) modes confirm the interest of such technology for high-frequency, high-power, and high-temperature operation. We present here record RF power measurements for different versions of amplifiers. Up to 260 W, i.e. 3.6 W/mm, in pulsed (10 µs/10%) conditions, and 105 W, i.e. 2.9 W/mm, in cw conditions were achieved. Such results are made possible thanks to the impressive performances of InAlN/GaN transistors, even when operating at high temperatures. Unit cell transistors deliver output powers of 4.3 W/mm at Vds = 40 V in the cw mode of operation at the frequency of 2 GHz. The transistor process is described here, as well as the amplifiers design and measurements, with a particular focus to the thermal management aspects.

Publisher

Cambridge University Press (CUP)

Subject

Electrical and Electronic Engineering

Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

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4. Improvement of Ohmic Contact for InAlGaN/AlN/GaN HEMTs with Recess Etching;physica status solidi (a);2018-03-25

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