Effect of boron incorporation on slow interface traps in SiO2/4H-SiC structures
Author:
Publisher
Springer Science and Business Media LLC
Subject
General Materials Science,General Chemistry
Link
http://link.springer.com/article/10.1007/s00339-016-0724-1/fulltext.html
Reference35 articles.
1. S. Harada, R. Kosugi, J. Senzaki, W.J. Cho, K. Fukuda, K. Arai, S. Suzuki, J. Appl. Phys. 91, 1568 (2002)
2. H. Li, S. Dimitrijev, H.B. Harrison, D. Sweatman, Appl. Phys. Lett. 70, 2028 (1997)
3. G.Y. Chung, C.C. Tin, J.R. Williams, K. McDonald, R.K. Chanana, R.A. Weller, S.T. Pantelides, L.C. Feldman, O.W. Holland, M.K. Das, J.W. Palmour, IEEE Electron Device Lett. 22, 176 (2001)
4. J. Rozen, A.C. Ahyi, X. Zhu, J.R. Williams, L.C. Feldman, I.E.E.E. Trans, Electron Devices 58, 3808 (2011)
5. G. Gudjónsson, H.Ö. Ólafsson, F. Allerstam, P.-Å. Nilsson, E.Ö. Sveinbjörnsson, H. Zirath, T. Rödle, R. Jos, IEEE Electron Device Lett. 26, 96 (2005)
Cited by 15 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Interface and oxide trap states of SiO2/GaN metal–oxide–semiconductor capacitors and their effects on electrical properties evaluated by deep level transient spectroscopy;Journal of Applied Physics;2023-09-05
2. The effects of stress on interfacial properties and flatband voltage instability of 4H-SiC MOS structures;Microelectronics Reliability;2023-08
3. Gate-oxide interface performance improvement technology of 4H-SiC MOSFET;Chinese Science Bulletin;2023-02-07
4. Improvement of Interfacial Properties of 4H-SiC/SiO2 by Nitrogen Plasma Treatment;2021 18th China International Forum on Solid State Lighting & 2021 7th International Forum on Wide Bandgap Semiconductors (SSLChina: IFWS);2021-12-06
5. Boron and barium incorporation at the 4H-SiC/SiO2 interface using a laser multi-charged ion source;Journal of Materials Science: Materials in Electronics;2021-05-17
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3