High-performance Ga2O3 Schottky Barrier Diode with a Self-aligned Shallow Groove and Dual Field-plate
Author:
Affiliation:
1. Hebei Semiconductor Research Institute,National Key Laboratory of Solid-State Microwave Devices and Circuits,Shijiazhuang,China
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/10365709/10365561/10365921.pdf?arnumber=10365921
Reference45 articles.
1. Gallium oxide (Ga2O3) metal-semiconductor field-effect transistors on single-crystal β-Ga2O3 (010) substrates
2. $\hbox{Ga}_{2} \hbox{O}_{3}$ Schottky Barrier Diodes Fabricated by Using Single-Crystal $\beta$– $\hbox{Ga}_{2} \hbox{O}_{3}$ (010) Substrates
3. First-principles study of the structural, electronic, and optical properties of Ga2O3 in its monoclinic and hexagonal phases;He;Physical Review B,2006
4. A review of Ga2O3materials, processing, and devices
5. Enhancement-mode Ga2O3 wrap-gate fin field-effect transistors on native (100) β-Ga2O3 substrate with high breakdown voltage
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