Scaled FinFETs Connected by Using Both Wafer Sides for Routing via Buried Power Rails
Author:
Affiliation:
1. Imec, Leuven, Belgium
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Link
http://xplorestaging.ieee.org/ielx7/16/9967813/09905642.pdf?arnumber=9905642
Reference19 articles.
1. Buried Power Rail Integration with Si FinFETs for CMOS Scaling beyond the 5 nm Node
2. Buried Power Rail Metal exploration towards the 1 nm Node
3. Direct Bonding of low Temperature Heterogeneous Dielectrics
4. Extreme Wafer Thinning and nano-TSV processing for 3D Heterogeneous Integration
5. Buried Power Rails and Nano-Scale TSV: Technology Boosters for Backside Power Delivery Network and 3D Heterogeneous Integration
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1. System technology co-optimization for advanced integration;Nature Reviews Electrical Engineering;2024-09-02
2. Electrical Characterization and Reliability Studies of Nano-TSV;2024 IEEE 74th Electronic Components and Technology Conference (ECTC);2024-05-28
3. Self-Heating Effect of Device-Circuit with Back-side Power Delivery Network beyond 3nm Node;2024 IEEE International Reliability Physics Symposium (IRPS);2024-04-14
4. Inflection Points in GAA NS-FET to C-FET Scaling Considering Impact of DTCO Boosters;IEEE Transactions on Electron Devices;2024-04
5. Impact of Backside Power Delivery Network with Buried Power Rails on Latch-up Immunity in DTCO/STCO;2023 45th Annual EOS/ESD Symposium (EOS/ESD);2023-10-02
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